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Muonium Emission into Vacuum from Mesoporous Thin Films at Cryogenic Temperatures
- Source :
- Physical Review Letters. 108
- Publication Year :
- 2012
- Publisher :
- American Physical Society (APS), 2012.
-
Abstract
- We report on Muonium (Mu) emission into vacuum following {\mu}+ implantation in mesoporous thin SiO2 films. We obtain a yield of Mu into vacuum of (38\pm4)% at 250 K temperature and (20\pm4)% at 100 K for 5 keV {\mu}+ implantation energy. From the implantation energy dependence of the Mu vacuum yield we determine the Mu diffusion constants in these films: D250KMu = (1.6 \pm 0.1) \times 10-4 cm2/s and D100KMu = (4.2\pm0.5)\times10-5 cm2/s. Describing the diffusion process as quantum mechanical tunneling from pore-to-pore, we reproduce the measured temperature dependence T^3/2 of the diffusion constant. We extract a potential barrier of (-0.3 \pm 0.1) eV which is consistent with our computed Mu work-function in SiO2 of [-0.3,-0.9] eV. The high Mu vacuum yield even at low temperatures represents an important step towards next generation Mu spectroscopy experiments.<br />Comment: 5 pages, 5 Figures
- Subjects :
- Physics
Atomic Physics (physics.atom-ph)
010308 nuclear & particles physics
Muonium
FOS: Physical sciences
General Physics and Astronomy
01 natural sciences
Physics - Atomic Physics
High Energy Physics - Experiment
3. Good health
High Energy Physics - Experiment (hep-ex)
0103 physical sciences
Thin film
Atomic physics
010306 general physics
Energy (signal processing)
Subjects
Details
- ISSN :
- 10797114 and 00319007
- Volume :
- 108
- Database :
- OpenAIRE
- Journal :
- Physical Review Letters
- Accession number :
- edsair.doi.dedup.....3872a5641a963c76dc909ff39c7a4be5