Back to Search
Start Over
A 2K-gate GaAs gate array with a WN gate self-alignment FET process
- Source :
- IEEE Journal of Solid-State Circuits. 20:1043-1049
- Publication Year :
- 1985
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 1985.
-
Abstract
- A 2K-gate DCFL GaAs gate array has been successfully fabricated with a WN gate self-alignment GaAs MESFET process. Chip size was 4.59 mm/spl times/4.73 mm. A basic cell, consisting of one DFET and three EFETs, can be programmed as an inverter or a two or three-INPUT NOR gate by personalizing with first- and second-level interconnection and via hole masks. The I/O buffer was implemented with a large DCFL push-pull circuit. The unloaded propagation delay time was 42 ps/gate at a power dissipation of 0.5 mW/gate. The increases in delay time due to various loading capacitance were 11-ps/fan-in. 16-ps/fan-out, 59-ps/1-mm interconnection and 0.95 ps/crossover (area: 2 /spl mu/m/spl times/3 /spl mu/m). An 8/spl times/8-bit parallel multiplier was fabricated on this gate-array chip. A multiplication time of 8.5 ns was achieved at a power dissipation of about 400 mW including I/O buffers.
Details
- ISSN :
- 1558173X and 00189200
- Volume :
- 20
- Database :
- OpenAIRE
- Journal :
- IEEE Journal of Solid-State Circuits
- Accession number :
- edsair.doi.dedup.....38b1799c695c2c8ceb24180cc40280ce
- Full Text :
- https://doi.org/10.1109/jssc.1985.1052434