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Hydrogenated amorphous silicon technology for chemically sensitive thin-film transistors

Authors :
Alessandro Pecora
Guglielmo Fortunato
L. Mariucci
Andrea Bearzotti
Roberto Leoni
P. Carelli
Source :
Scopus-Elsevier

Abstract

Top-gate hydrogenated amorphous silicon thin-film transistors have been fabricated which show electrical characteristics suitable for application in the field of chemical sensors. These devices have been specialized to two different types of sensors: (a) Pd-gate hydrogen sensors; (b) K+ ion sensors. The obtained results show that the present technology can be successfully applied to the fabrication of gas-sensitive and ion-sensitive field-effect transistors.

Details

Database :
OpenAIRE
Journal :
Scopus-Elsevier
Accession number :
edsair.doi.dedup.....3b215f18a609049f758b9c56ce1005c8