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Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold

Authors :
Igor Alexandrovich Makhotkin
Jaromír Chalupský
Dorota Klinger
Ryszard Sobierajski
Libor Juha
Marek Jurek
Elke Plönjes
Iwanna Jacyna
Karel Saksl
Sebastian Strobel
Michael Störmer
Frank Siewert
Kai Tiedtke
Eric Louis
Barbara Keitel
Igor Milov
Věra Hájková
Tobias Mey
Laurent Nittler
R.A. Loch
Gosse de Vries
Sven Toleikis
Martin Hermann
Siegfried Schreiber
Y. Syryanyy
Tomáš Burian
Han Kwang Nienhuys
Hartmut Enkisch
Grzegorz Gwalt
Bart Faatz
V. Vozda
Robbert Wilhelmus Elisabeth van de Kruijs
Frank Scholze
XUV Optics
Source :
Journal of synchrotron radiation 25(1), 77-84 (2018). doi:10.1107/S1600577517017362, Journal of Synchrotron Radiation, Makhotkin, I.A.; Sobierajski, R.; Chalupský, J.; Tiedtke, K.; De Vries, G.; Störmer, M.; Scholze, F.; Siewert, F.; Van De Kruijs, R.W.E.; Milov, I.; Louis, E.; Jacyna, I.; Jurek, M.; Klinger, D.; Nittler, L.; Syryanyy, Y.; Juha, L.; Hájková, V.; Vozda, V.; Burian, T.; Saksl, K.; Faatz, B.; Keitel, B.; Plönjes, E.; Schreiber, S.; Toleikis, S.; Loch, R.; Hermann, M.; Strobel, S.; Nienhuys, H.-K.; Gwalt, G.; Mey, T.; Enkisch, H.: Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold. In: Journal of Synchrotron Radiation. Vol. 25 (2018) 1, 77-84. (DOI: /10.1107/S1600577517017362), Journal of synchrotron radiation, 25(1), 77-84. International Union of Crystallography
Publication Year :
2018
Publisher :
International Union of Crystallography (IUCr), 2018.

Abstract

Journal of synchrotron radiation 25(1), 77 - 84 (2018). doi:10.1107/S1600577517017362<br />The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.<br />Published by IUCr, Chester

Details

ISSN :
16005775 and 09090495
Volume :
25
Database :
OpenAIRE
Journal :
Journal of Synchrotron Radiation
Accession number :
edsair.doi.dedup.....3db3625e434f17702e7c6f075fcc8a20
Full Text :
https://doi.org/10.1107/s1600577517017362