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Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold
- Source :
- Journal of synchrotron radiation 25(1), 77-84 (2018). doi:10.1107/S1600577517017362, Journal of Synchrotron Radiation, Makhotkin, I.A.; Sobierajski, R.; Chalupský, J.; Tiedtke, K.; De Vries, G.; Störmer, M.; Scholze, F.; Siewert, F.; Van De Kruijs, R.W.E.; Milov, I.; Louis, E.; Jacyna, I.; Jurek, M.; Klinger, D.; Nittler, L.; Syryanyy, Y.; Juha, L.; Hájková, V.; Vozda, V.; Burian, T.; Saksl, K.; Faatz, B.; Keitel, B.; Plönjes, E.; Schreiber, S.; Toleikis, S.; Loch, R.; Hermann, M.; Strobel, S.; Nienhuys, H.-K.; Gwalt, G.; Mey, T.; Enkisch, H.: Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold. In: Journal of Synchrotron Radiation. Vol. 25 (2018) 1, 77-84. (DOI: /10.1107/S1600577517017362), Journal of synchrotron radiation, 25(1), 77-84. International Union of Crystallography
- Publication Year :
- 2018
- Publisher :
- International Union of Crystallography (IUCr), 2018.
-
Abstract
- Journal of synchrotron radiation 25(1), 77 - 84 (2018). doi:10.1107/S1600577517017362<br />The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.<br />Published by IUCr, Chester
- Subjects :
- Nuclear and High Energy Physics
Materials science
genetic structures
Extreme ultraviolet lithography
UT-Hybrid-D
02 engineering and technology
free electron laser induced damage
EUV optics
thin films
FELs
01 natural sciences
Fluence
law.invention
010309 optics
Optics
law
0103 physical sciences
Total external reflection
Irradiation
Instrumentation
Thin Films
Free-Electron laser induced damage
Radiation
business.industry
Photondiag2017 Workshop
021001 nanoscience & nanotechnology
Laser
eye diseases
Optical coating
Angle of incidence (optics)
Extreme ultraviolet
ddc:540
0210 nano-technology
business
Subjects
Details
- ISSN :
- 16005775 and 09090495
- Volume :
- 25
- Database :
- OpenAIRE
- Journal :
- Journal of Synchrotron Radiation
- Accession number :
- edsair.doi.dedup.....3db3625e434f17702e7c6f075fcc8a20
- Full Text :
- https://doi.org/10.1107/s1600577517017362