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Improved analysis methods to study the behavior of potassium ions in the interlayer of montmorillonite

Authors :
Zhan Zhao
Gang Xie
Pengfei Hu
Mingyi Deng
Sipei Hu
Huang Danchao
Pingya Luo
Wai Li
Source :
Journal of Materials Research and Technology, Vol 9, Iss 4, Pp 7754-7761 (2020)
Publication Year :
2020
Publisher :
Elsevier, 2020.

Abstract

The behavior of potassium chloride (KCl) as a main mud shale inhibitor remains poorly defined in the interlayer of montmorillonite (Mt). In this paper, a new analysis method of transmission electron microscopy-energy dispersive X-ray spectroscopy (TEM-EDS) was established. The distribution of K+ in the interlayer of Mt and the processes surrounding d-spacing shifts in Mt were investigated through X-ray diffraction and TEM-EDS. The experimental results revealed shoulder peaks in the diffraction patterns at KCl concentrations between 11% and 19%. The distribution of K+ varied in the inner and outer layers of Mt with different KCl concentrations. It could be concluded that the distribution of K+ and the changes in d-spacing of Na are determined by two factors: negative charge sites and concentration difference. When the KCl concentration was below 8%, both factors cause the outer layer of Mt to adsorb more K+ than the inner layer, with all layers exhibiting d-spacings within the 1.50 nm state. At an 8% KCl concentration, all negative charge sites were occupied by K+. As the KCl concentration rose above 8%, the outer layer of Mt adsorbed more K+ than the inner layer due to the concentration difference. With a further increase in the KCl concentration, the d-spacing shifted linearly to 1.30 nm from the outer to the inner layer of Mt. All layers of Mt exhibited a d-spacing of 1.30 nm at KCl concentrations of up to 23%. These results demonstrate the benefits and capabilities of the proposed method in investigating the intercalating mechanisms of Mt.

Details

Language :
English
ISSN :
22387854
Volume :
9
Issue :
4
Database :
OpenAIRE
Journal :
Journal of Materials Research and Technology
Accession number :
edsair.doi.dedup.....3f7abaad0931d433a44e0fa49d1ed9ab