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A stress relaxation mechanism through buckling-induced dislocations in thin films

Authors :
Christophe Coupeau
Jean Grilhé
Julien Durinck
Jérôme Colin
Laboratoire de Physique des Matériaux (PhyMat)
Centre National de la Recherche Scientifique (CNRS)-Université de Poitiers
Source :
Journal of Applied Physics, Journal of Applied Physics, American Institute of Physics, 2010, 108 (2), pp.026104. ⟨10.1063/1.3457225⟩
Publication Year :
2010
Publisher :
AIP Publishing, 2010.

Abstract

We report on molecular dynamics simulations of thin film buckling which show that during the buckling phenomena dislocations can be emitted from specific region of the film where the heterogeneous stress was found to be maximum and larger than in the planar adherent part. A scenario of formation of misfit dislocations in the planar interface which lead to stress relaxation is finally proposed.

Details

ISSN :
10897550 and 00218979
Volume :
108
Database :
OpenAIRE
Journal :
Journal of Applied Physics
Accession number :
edsair.doi.dedup.....3fb47f238035ffa11e7b55757ceb2480
Full Text :
https://doi.org/10.1063/1.3457225