Oxygen background gas influence on pulsed laser deposition process of LaAlO3 and LaGaO3

MLA

C. Aruta, et al. Oxygen Background Gas Influence on Pulsed Laser Deposition Process of LaAlO3 and LaGaO3. Jan. 2011. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....47217898e6d8f923fad683b1d01d7107&authtype=sso&custid=ns315887.

APA

C. Aruta, Riccardo Bruzzese, Xuan Wang, Salvatore Amoruso, U. Scotti di Uccio, F. Miletto Granozio, & P. Aurino. (2011). Oxygen background gas influence on pulsed laser deposition process of LaAlO3 and LaGaO3.

Chicago

C. Aruta, Riccardo Bruzzese, Xuan Wang, Salvatore Amoruso, U. Scotti di Uccio, F. Miletto Granozio, and P. Aurino. 2011. “Oxygen Background Gas Influence on Pulsed Laser Deposition Process of LaAlO3 and LaGaO3,” January. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....47217898e6d8f923fad683b1d01d7107&authtype=sso&custid=ns315887.