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Propriétés électriques des structures MIS sur InP passivé par un oxyde
- Source :
- Revue de Physique Appliquée, Revue de Physique Appliquée, Société française de physique / EDP, 1989, 24 (2), pp.189-194. ⟨10.1051/rphysap:01989002402018900⟩
- Publication Year :
- 1989
- Publisher :
- HAL CCSD, 1989.
-
Abstract
- By oxidation of InP in liquid medium, condensed indium phosphate In(PO 3 ) 3 could be obtained. In a previous work the physicochemical properties of this compound were studied and it was shown that it could be a good candidate for the passivation of InP. In this work MIS capacitors have been elaborated using this native oxide, C(V) characteristics of these structures have been measured and analysed. From these results, it was inferred that the minimum of the interface state density is typically of 10 11 cm -2 eV -1 Par oxydation de l'InP en milieu liquide on peut obtenir le phosphate condense In(PO 3 ) 3 . L'etude des proprietes physicochimiques de ce compose a deja montre qu'il pouvait etre un bon candidat a la passivation de l'InP. Dans ce travail, des capacites MIS ont ete fabriquees en utilisant cet oxyde natif, et les caracteristiques C(V) de ces structures ont ete mesurees et analysees. Ces resultats montrent que le minimum de la densite d'etats d'interface est typiquement de 10 11 cm -2 eV -1
- Subjects :
- Passivation
Chemistry
oxidation
020209 energy
Mineralogy
02 engineering and technology
Liquid medium
semiconductor
021001 nanoscience & nanotechnology
InP In PO sub 3 sub 3
interface state density
Indium phosphate
indium compounds
metal insulator semiconductor structures
capacitance voltage characteristics
State density
MIS capacitors
[PHYS.HIST]Physics [physics]/Physics archives
III V semiconductors
native oxide
0202 electrical engineering, electronic engineering, information engineering
Physical chemistry
interface electron states
passivation
0210 nano-technology
Subjects
Details
- Language :
- French
- ISSN :
- 00351687 and 27773671
- Database :
- OpenAIRE
- Journal :
- Revue de Physique Appliquée, Revue de Physique Appliquée, Société française de physique / EDP, 1989, 24 (2), pp.189-194. ⟨10.1051/rphysap:01989002402018900⟩
- Accession number :
- edsair.doi.dedup.....4728370cee62ec87028e45260ce6b3db
- Full Text :
- https://doi.org/10.1051/rphysap:01989002402018900⟩