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Hall and Field-Effect Mobilities of Electrons Accumulated at a Lattice-Matched ZnO/ScAlMgO4 Heterointerface

Authors :
Atsushi Tsukazaki
Futami Sato
Jyunya Nishii
Hideo Ohno
Masashi Kawasaki
Akira Ohtomo
Takao I. Suzuki
Source :
Advanced Materials. 16:1887-1890
Publication Year :
2004
Publisher :
Wiley, 2004.

Abstract

At a lattice-matched ZnO/ScAIMgO(4) heterointerface, Hall and field-effect mobilities of grain-boundary-free ZnO channels have been simultaneously characterized under a gate electric field (E-G) applied through a ScAIMGO(4) dielectric gate. The field-effect mobility increased linearly with increasing EG (see Figure), clearly in contrast to the supralinear (exponential) dependence that has been previously reported for polycrystalline channels.

Details

ISSN :
15214095 and 09359648
Volume :
16
Database :
OpenAIRE
Journal :
Advanced Materials
Accession number :
edsair.doi.dedup.....509844335aecd960c24b6a61bb917ffe
Full Text :
https://doi.org/10.1002/adma.200401018