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Modeling and Simulation of SU-8 Thick Photoresist Lithography

Modeling and Simulation of SU-8 Thick Photoresist Lithography

Authors :
Zai-Fa Zhou
Qing-An Huang
Source :
Micro/Nano Technologies ISBN: 9789811059445, Toxinology ISBN: 9789400767256
Publication Year :
2018
Publisher :
Springer Singapore, 2018.

Details

ISBN :
978-981-10-5944-5
978-94-007-6725-6
ISBNs :
9789811059445 and 9789400767256
Database :
OpenAIRE
Journal :
Micro/Nano Technologies ISBN: 9789811059445, Toxinology ISBN: 9789400767256
Accession number :
edsair.doi.dedup.....525640639de7a5ecbbf5d4424d6fbbd6
Full Text :
https://doi.org/10.1007/978-981-10-5945-2_3