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Superior Electro-Oxidation and Corrosion Resistance of Monolayer Transition Metal Disulfides

Authors :
Daniel S. Schulman
Nasim Alem
Dan May-Rawding
Fu Zhang
Saptarshi Das
Drew Buzzell
Source :
ACS Applied Materials & Interfaces. 10:4285-4294
Publication Year :
2018
Publisher :
American Chemical Society (ACS), 2018.

Abstract

Physics of monolayer and few-layer transition metal dichalcogenides (TMDs) and chemistry of few-layer TMDs have been well studied in recent years in the context of future electronic, optoelectronic, and energy harvesting applications. However, what has escaped the attention of the scientific community is the unique chemistry of monolayer TMDs. It has been demonstrated that the basal plane of multilayer TMDs is chemically inert, whereas edge sites are chemically active. In this article, we experimentally demonstrate that the edge reactivity of the TMDs can be significantly impeded at the monolayer limit through monolayer/substrate interaction, thus making the monolayers highly resistant to electrooxidation and corrosion. In particular, we found that few-layer flakes of MoS2 and WS2 exfoliated on conductive TiN substrates are readily corroded beyond a certain positive electrode potential, while monolayer remnants are left behind unscathed. The electrooxidation resistance of monolayers was confirmed using a ...

Details

ISSN :
19448252 and 19448244
Volume :
10
Database :
OpenAIRE
Journal :
ACS Applied Materials & Interfaces
Accession number :
edsair.doi.dedup.....60da11f09b3d77823b41613946facd29
Full Text :
https://doi.org/10.1021/acsami.7b17660