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Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography
- Source :
- IEEE Photonics Journal, Vol 11, Iss 6, Pp 1-10 (2019)
- Publication Year :
- 2019
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2019.
-
Abstract
- Microstructures are fabricated with a fast fabrication speed, submicron-scale precision and a minimum feature size of 1.5 μm. The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital mirror device (DMD) and photocurable resin, which has a broad range of uses in three-dimensional (3D) printing. To illustrate the feasibility of this method, a Dammann grating is fabricated. Using a series of experiments and optimized designs, we analyze the characteristics of the photocurable resin, quantify the dose modulation for lithography and redesign the mask pattern. Consequently, a Dammann grating with a 50% diffraction efficiency is successfully fabricated, which can not only guarantee the precision but also maintain the fabrication speed. This work demonstrates the potential of this method to rapidly and directly manufacture binary optical elements or structures at the nanoscale based on photocurable resin and DMD-based maskless lithography.
- Subjects :
- lcsh:Applied optics. Photonics
Rapid prototyping
Fabrication
Materials science
Maskless lithography
02 engineering and technology
micro-structure
Grating
Diffraction efficiency
binary optical element
Dammann grating
0202 electrical engineering, electronic engineering, information engineering
lcsh:QC350-467
Electrical and Electronic Engineering
Lithography
Nanoscopic scale
rapid prototyping
business.industry
lcsh:TA1501-1820
020206 networking & telecommunications
Atomic and Molecular Physics, and Optics
Modulation
Optoelectronics
business
lcsh:Optics. Light
Subjects
Details
- ISSN :
- 19430647
- Volume :
- 11
- Database :
- OpenAIRE
- Journal :
- IEEE Photonics Journal
- Accession number :
- edsair.doi.dedup.....67c15b2d10081bd22a05f23c014bed5e