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Optimizing the Number of Steps and the Noise in Staircase APDs with Ternary III - V Semiconductor Alloys
- Source :
- 2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Grenoble (FR), 2019, info:cnr-pdr/source/autori:Pilotto A.; Esseni D.; Menk R.H.; Steinhartova T.; Nichetti C.; Palestri P.; Selmi L.; Antonelli M.; Arfelli F.; Biasiol G.; Cautero G.; Driussi F./congresso_nome:2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)/congresso_luogo:Grenoble (FR)/congresso_data:2019/anno:2019/pagina_da:/pagina_a:/intervallo_pagine
- Publication Year :
- 2019
- Publisher :
- Institute of Electrical and Electronics Engineers Inc., 2019.
-
Abstract
- We report simulation results for gain and noise in avalanche photodiodes fabricated using heterojunctions of III-V compound semiconductors. We employ a recently developed nonlocal model for impact ionization. The model has been calibrated and validated on devices fabricated and measured in our labs and data from the literature. The model is then used to explore the design trade-offs related to the number of conduction band steps in staircase APDs for X-ray detection based on the GaAs/AlGaAs material system.
- Subjects :
- Impact Ionization
Materials science
APDS
02 engineering and technology
[object Object]
01 natural sciences
Noise (electronics)
law.invention
Avalanche Photo diode
Modeling
law
0103 physical sciences
010302 applied physics
business.industry
Heterojunction
021001 nanoscience & nanotechnology
Avalanche photodiode
Condensed Matter::Mesoscopic Systems and Quantum Hall Effect
Impact ionization
Optoelectronics
Compound semiconductor
Semiconductor alloys
0210 nano-technology
Ternary operation
business
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- 2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS), Grenoble (FR), 2019, info:cnr-pdr/source/autori:Pilotto A.; Esseni D.; Menk R.H.; Steinhartova T.; Nichetti C.; Palestri P.; Selmi L.; Antonelli M.; Arfelli F.; Biasiol G.; Cautero G.; Driussi F./congresso_nome:2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)/congresso_luogo:Grenoble (FR)/congresso_data:2019/anno:2019/pagina_da:/pagina_a:/intervallo_pagine
- Accession number :
- edsair.doi.dedup.....69efd47e579404bf329206525b37471d