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Plasma activated coatings with dual action against fungi and bacteria

Authors :
Bryan R. Coad
Steven G. Wise
Thomas D. Michl
Hans J. Griesser
Kitty K. K. Ho
Naresh Kumar
Carla Giles
Lewis J. Martin
Marcela M.M. Bilek
Behnam Akhavan
Omid Sharifahmadian
Akhavan, Behnam
Michl, Thomas D
Giles, Carla
Ho, Kitty
Martin, Lewis
Sharifahmadian, Omid
Wise, Steven G
Coad, Bryan R
Kumar, Naresh
Griesser, Hans J
Bilek, Marcela M
Source :
Applied Materials Today. 12:72-84
Publication Year :
2018
Publisher :
Elsevier BV, 2018.

Abstract

In the oral cavity, dental implants are exposed to an environment rich in various microbes that can produce infectious biofilms on the implant surface. Here we report the development of two distinct antimicrobial coatings that prevent biofilm formation by fungi or bacteria. The antimicrobial peptides Mel4 and caspofungin were immobilized on titanium surfaces through reactions with radicals embedded within a mechanically robust, ion-assisted plasma polymerized (PP) film. The immobilization does not require additional chemical reagents and is achieved by simply incubating the surfaces at room temperature in a buffer solution containing the antimicrobial agent. The antibiotic-functionalized surfaces were rigorously washed with hot sodium dodecyl sulphate (SDS) to remove physisorbed molecules, and analyzed by time of flight secondary ion mass spectrometry (ToF-SIMS), which revealed characteristic fragments of the peptides and provided strong evidence for the covalent nature of the binding between the molecules and the PP coating. Both Candida albicans and Staphylococcus aureus pathogens were significantly inhibited in their ability to colonize the surfaces and form biofilms. Our findings suggest that antimicrobial surfaces fabricated using ion-assisted plasma polymerization have great potential for coatings on biomedical devices where activity against fungal and bacterial pathogens is required. Refereed/Peer-reviewed

Details

ISSN :
23529407
Volume :
12
Database :
OpenAIRE
Journal :
Applied Materials Today
Accession number :
edsair.doi.dedup.....6eef3388050080a93b9324256be9c356