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Field Controlled Si Hall Element with Extended Operation Temperature Range from Liquid Helium Temperature up to 650K

Authors :
A. A. Malykh
V.N. Mordkovich
M. I. Pavlyuk
A.V. Leonov
Source :
Procedia Engineering. 120:1197-1200
Publication Year :
2015
Publisher :
Elsevier BV, 2015.

Abstract

The construction of Si Hall element formed in thin Si layer of SOI structure is considered. Hall element is a part of SOI FET accumulation mode transistor with built-in channel and MISIM field control systems. Such Hall element characterized by wide range of operation temperature from liquid Helium temperature up to 650K.

Details

ISSN :
18777058
Volume :
120
Database :
OpenAIRE
Journal :
Procedia Engineering
Accession number :
edsair.doi.dedup.....745da5853c2256b63361ac11d188703b
Full Text :
https://doi.org/10.1016/j.proeng.2015.08.786