Use of Supramolecular Assemblies as Lithographic Resists

MLA

Scott M. Lewis, et al. “Use of Supramolecular Assemblies as Lithographic Resists.” Angewandte Chemie, vol. 129, May 2017, pp. 6853–56. EBSCOhost, https://doi.org/10.1002/ange.201700224.

APA

Scott M. Lewis, George F. S. Whitehead, Fredrik Schedin, Guy A. DeRose, Stephen G. Yeates, Jesús Ferrando-Soria, Axel Scherer, Grigore A. Timco, Richard E. P. Winpenny, Hayden R. Alty, Sarah Varey, Matthew S. Hunt, Andreas K. Kostopoulos, Agnese Lagzda, Antonio Fernandez, & Christopher A. Muryn. (2017). Use of Supramolecular Assemblies as Lithographic Resists. Angewandte Chemie, 129, 6853–6856. https://doi.org/10.1002/ange.201700224

Chicago

Scott M. Lewis, George F. S. Whitehead, Fredrik Schedin, Guy A. DeRose, Stephen G. Yeates, Jesús Ferrando-Soria, Axel Scherer, et al. 2017. “Use of Supramolecular Assemblies as Lithographic Resists.” Angewandte Chemie 129 (May): 6853–56. doi:10.1002/ange.201700224.