Scanning Tunneling Microscopy of Initial Nitridation Processes on Oxidized Si(100) Surface with Radical Nitrogen

MLA

Hiroya Ikeda, et al. “Scanning Tunneling Microscopy of Initial Nitridation Processes on Oxidized Si(100) Surface with Radical Nitrogen.” Japanese Journal of Applied Physics, vol. 42, Apr. 2003, pp. 1966–70. EBSCOhost, https://doi.org/10.1143/jjap.42.1966.

APA

Hiroya Ikeda, Mitsuo Sakashita, Ryoya Takahashi, Akira Sakai, Shigeaki Zaima, Osamu Nakatsuka, Yukio Yasuda, & Yasushi Kobayashi. (2003). Scanning Tunneling Microscopy of Initial Nitridation Processes on Oxidized Si(100) Surface with Radical Nitrogen. Japanese Journal of Applied Physics, 42, 1966–1970. https://doi.org/10.1143/jjap.42.1966

Chicago

Hiroya Ikeda, Mitsuo Sakashita, Ryoya Takahashi, Akira Sakai, Shigeaki Zaima, Osamu Nakatsuka, Yukio Yasuda, and Yasushi Kobayashi. 2003. “Scanning Tunneling Microscopy of Initial Nitridation Processes on Oxidized Si(100) Surface with Radical Nitrogen.” Japanese Journal of Applied Physics 42 (April): 1966–70. doi:10.1143/jjap.42.1966.