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Microporous silicon and biosensor development: structural analysis, electrical characterisation and biocapacity evaluation
- Source :
- Biosensors and Bioelectronics. 21:282-292
- Publication Year :
- 2005
- Publisher :
- Elsevier BV, 2005.
-
Abstract
- An investigation of the fabrication of microporous silicon (MPS) layers as a material for the development of an electrolyte insulator semiconductor (EIS) capacitance sensor has been performed. The goal was to create a high surface area substrate for the immobilisation of biorecognition elements. Structural analysis of MPS layers as a function of key etch parameters, namely implant type (p or n), implant dose, hydrofluoric acid (HF) etch concentration and current density has been performed using scanning electron microscopy (SEM). It was possible to image porous layers with average pore diameter as low as 4 nm. n-type silicon samples had larger pore networks than p-type samples and reducing the silicon resistivity led to a reduction in the pores per μm 2 . It was found that increasing the HF etch concentration reduced the average pore diameter and increased the pores per μm 2 . Increasing the current density at which the etch was performed has the same effect. Understanding the effect of these parameters allows the MPS layer to be tuned to match specifications for optimum biocapacity. Different MPS layers were electrically characterised using capacitance–voltage and capacitance–frequency sweeps, in order to determine the effect of porosity on increases in surface area. The measured capacitance increased with increasing pores per μm 2 . p-type silicon with a boron implant in the back of the wafer, which had been etched in 25% HF in ethanol at a current density of 75 mA/cm 2 yielded the highest capacitance signal per unit area. The effect of porosity and pore size on the biocapacity of the samples was also determined. For avidin immobilisation, with pores sizes above 5 nm, as the porosity increased the biocapacity increased. MPS fabricated in p-type silicon with a front and back implant etched in 25% HF at a current density of 25 mA/cm 2 was used for the capacitance detection of synthetic oligonucleotides.
- Subjects :
- Silicon
Materials science
Surface Properties
Scanning electron microscope
Biomedical Engineering
Biophysics
Analytical chemistry
chemistry.chemical_element
Biosensing Techniques
Porous silicon
Capacitance
Coated Materials, Biocompatible
Electric Impedance
Electrochemistry
Wafer
Composite material
Porosity
In Situ Hybridization
DNA
Equipment Design
General Medicine
Microporous material
Equipment Failure Analysis
chemistry
Current density
Biotechnology
Subjects
Details
- ISSN :
- 09565663
- Volume :
- 21
- Database :
- OpenAIRE
- Journal :
- Biosensors and Bioelectronics
- Accession number :
- edsair.doi.dedup.....80a0056b95527bac596801f07fa9b44c
- Full Text :
- https://doi.org/10.1016/j.bios.2004.09.031