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Laser engineering of carbon materials for optoelectronic applications

Authors :
Frédéric Antoni
François Stock
Laboratoire des sciences de l'ingénieur, de l'informatique et de l'imagerie (ICube)
École Nationale du Génie de l'Eau et de l'Environnement de Strasbourg (ENGEES)-Université de Strasbourg (UNISTRA)-Institut National des Sciences Appliquées - Strasbourg (INSA Strasbourg)
Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Institut National de Recherche en Informatique et en Automatique (Inria)-Les Hôpitaux Universitaires de Strasbourg (HUS)-Centre National de la Recherche Scientifique (CNRS)-Matériaux et Nanosciences Grand-Est (MNGE)
Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Réseau nanophotonique et optique
Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA)-Centre National de la Recherche Scientifique (CNRS)
Institut National des Sciences Appliquées - Strasbourg (INSA Strasbourg)
Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Université de Strasbourg (UNISTRA)-Centre National de la Recherche Scientifique (CNRS)-École Nationale du Génie de l'Eau et de l'Environnement de Strasbourg (ENGEES)-Réseau nanophotonique et optique
Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Centre National de la Recherche Scientifique (CNRS)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Matériaux et nanosciences d'Alsace (FMNGE)
Institut de Chimie du CNRS (INC)-Université de Strasbourg (UNISTRA)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Institut National de la Santé et de la Recherche Médicale (INSERM)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Strasbourg (UNISTRA)-Institut National de la Santé et de la Recherche Médicale (INSERM)-Centre National de la Recherche Scientifique (CNRS)
Source :
Laser Annealing Processes in Semiconductor Technology, Theory, Modeling, and Applications in Nanoelectronics, Laser Annealing Processes in Semiconductor Technology, Theory, Modeling, and Applications in Nanoelectronics, Woodhead Publishing Series in Electronic and Optical Materials, Elsevier Ltd., 2021, 978-0-12-820255-5. ⟨10.1016/B978-0-12-820255-5.00005-2⟩
Publication Year :
2021
Publisher :
HAL CCSD, 2021.

Abstract

Nowadays, optoelectronic and display devices are deeply rooted in our all-day life. With the emerging and growing of new communication technologies, connected devices, Internet of Things, augmented reality (AR), virtual reality (VR), and smart objects, the use of optoelectronic devices achieves high marks. What all these screen devices have in common is the necessity to transport electric current through the surface of the screen without interfering with the emitted light. To achieve this aim, transparent conductive oxides are currently used as electrodes, whether in display devices such as liquid crystal touch screens, OLED, or in certain photovoltaic cells. The most commonly used electrodes are based on the ITO that offers very interesting performances by owning high transparency in the visible range and high electrical conductivity. Finding a reliable alternative to this transparent conductive oxide with suitable performances appears to be a key point for present and future generations of displays and optoelectronic devices. In all this alternatives solution to ITO, we also have to seriously consider graphene or graphene-like thin films. We propose a solution only based on laser processes and pure carbon. This approach appears to be a serious alternative to more standard technologies. Laser processing offers many advantages like generating low process cost (compared to heavier deposition and treatment technologies), being scalable over large surfaces and being applicable on various substrates, and offering a compatibility with standard microelectronic processes.

Details

Language :
English
ISBN :
978-0-12-820255-5
ISBNs :
9780128202555
Database :
OpenAIRE
Journal :
Laser Annealing Processes in Semiconductor Technology, Theory, Modeling, and Applications in Nanoelectronics, Laser Annealing Processes in Semiconductor Technology, Theory, Modeling, and Applications in Nanoelectronics, Woodhead Publishing Series in Electronic and Optical Materials, Elsevier Ltd., 2021, 978-0-12-820255-5. ⟨10.1016/B978-0-12-820255-5.00005-2⟩
Accession number :
edsair.doi.dedup.....8358d918fc9f5e18fe6d28f060ed9aab
Full Text :
https://doi.org/10.1016/B978-0-12-820255-5.00005-2⟩