Advanced resist processing for thick photoresist applications

MLA

M. Rothe, et al. Advanced Resist Processing for Thick Photoresist Applications. Jan. 1996. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....8838481eb6f260248636655b366e7134&authtype=sso&custid=ns315887.

APA

M. Rothe, E. Cullmann, B. Loechel, & A. Maciossek. (1996). Advanced resist processing for thick photoresist applications.

Chicago

M. Rothe, E. Cullmann, B. Loechel, and A. Maciossek. 1996. “Advanced Resist Processing for Thick Photoresist Applications,” January. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....8838481eb6f260248636655b366e7134&authtype=sso&custid=ns315887.