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Silicon Oxide (SiO x ): A Promising Material for Resistance Switching?
- Source :
- Advanced Materials
- Publication Year :
- 2018
- Publisher :
- Wiley, 2018.
-
Abstract
- Interest in resistance switching is currently growing apace. The promise of novel high-density, low-power, high-speed nonvolatile memory devices is appealing enough, but beyond that there are exciting future possibilities for applications in hardware acceleration for machine learning and artificial intelligence, and for neuromorphic computing. A very wide range of material systems exhibit resistance switching, a number of which-primarily transition metal oxides-are currently being investigated as complementary metal-oxide-semiconductor (CMOS)-compatible technologies. Here, the case is made for silicon oxide, perhaps the most CMOS-compatible dielectric, yet one that has had comparatively little attention as a resistance-switching material. Herein, a taxonomy of switching mechanisms in silicon oxide is presented, and the current state of the art in modeling, understanding fundamental switching mechanisms, and exciting device applications is summarized. In conclusion, silicon oxide is an excellent choice for resistance-switching technologies, offering a number of compelling advantages over competing material systems.
- Subjects :
- Imagination
ReRAM
Materials science
media_common.quotation_subject
Hardware_PERFORMANCEANDRELIABILITY
02 engineering and technology
Memristor
01 natural sciences
law.invention
law
0103 physical sciences
Hardware_INTEGRATEDCIRCUITS
General Materials Science
Silicon oxide
media_common
010302 applied physics
Mechanical Engineering
021001 nanoscience & nanotechnology
Engineering physics
silicon oxide
Resistive random-access memory
Non-volatile memory
memristors
CMOS
Neuromorphic engineering
Mechanics of Materials
Hardware acceleration
0210 nano-technology
resistance switching
Subjects
Details
- ISSN :
- 15214095 and 09359648
- Volume :
- 30
- Database :
- OpenAIRE
- Journal :
- Advanced Materials
- Accession number :
- edsair.doi.dedup.....8fc215051c94107d7970a3ff2666a399
- Full Text :
- https://doi.org/10.1002/adma.201801187