Application of pulsed injection MOCVD to the deposition of dielectric and ferroelectric oxide layers and superlattices

The technique used for the control of the injection of fuel in thermal motors has been applied to the generation of active gases for MOCVD layers deposition. A wide variety of compounds and multilayers have already been grown using this new CVD source (from simple cxides, nitrides or metals to complex ternary oxides). Using two injection sources working sequentially, stackings like YBa2Cu307/CeO2 or SrTiO3/YBa2Cu3O7 double layers, Ta2O5/SiO2 amorphous or crystallized multilayers and SrTiO3/BaTiO3 or YBa2Cu3O7/PrBa2Cu3O7 epitaxial superlattices have been synthesized. The injection MOCVD seems to be a very promising technique for the stacking of multicomponents oxides having different electronic properties. This opens the way for the synthesis of a wide set of artificial materials, exhibiting completely new properties that cover a very large range of potential applications. After a description of the technique, we will demonstrate its performances on some results obtained on the synthesis of dielectric and ferroelectric layers and multilayers.