Cite
Isotopic labeling study of the oxygen diffusion in HfO2/SiO2/Si
MLA
Kaoru Nakajima, et al. “Isotopic Labeling Study of the Oxygen Diffusion in HfO2/SiO2/Si.” APPLIED PHYSICS LETTERS, vol. 90, no. 13, Jan. 2007. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....91d18cd40c6e7488b988f85e903e9e78&authtype=sso&custid=ns315887.
APA
Kaoru Nakajima, Ming Zhao, Kenji Shiraishi, Kazuyoshi Torii, Keisaku Yamada, Heiji Watanabe, Satoshi Kamiyama, Masashi Uematsu, Motofumi Suzuki, Toyohiro Chikyow, Yasuo Nara, & Kenji Kimura. (2007). Isotopic labeling study of the oxygen diffusion in HfO2/SiO2/Si. APPLIED PHYSICS LETTERS, 90(13).
Chicago
Kaoru Nakajima, Ming Zhao, Kenji Shiraishi, Kazuyoshi Torii, Keisaku Yamada, Heiji Watanabe, Satoshi Kamiyama, et al. 2007. “Isotopic Labeling Study of the Oxygen Diffusion in HfO2/SiO2/Si.” APPLIED PHYSICS LETTERS 90 (13). http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....91d18cd40c6e7488b988f85e903e9e78&authtype=sso&custid=ns315887.