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ORMOSIL thin films: Tuning mechanical properties via a nanochemistry approach
- Source :
- Langmuir 22 (2006): 11158–11162. doi:10.1021/la061520w, info:cnr-pdr/source/autori:Giovanni Palmisano, Eric Le Bourhis, Rosaria Ciriminna, Davide Tranchida, Mario Pagliaro/titolo:ORMOSIL thin films: tuning the mechanical properties via a nanochemistry appoach/doi:10.1021%2Fla061520w/rivista:Langmuir/anno:2006/pagina_da:11158/pagina_a:11162/intervallo_pagine:11158–11162/volume:22
- Publication Year :
- 2006
-
Abstract
- The mechanical properties (hardness and elastic modulus) of organically modified silicate thin films can be finely tuned by varying the degree of alkylation and thus the fraction of six- and four-membered siloxane rings in the organosilica matrix. This opens the way to large tunability of parameters that are of crucial practical importance for films that are finding increasing application in numerous fields ranging from microelectronics to chemical sensing.
- Subjects :
- Photons
Materials science
business.industry
Nanochemistry
Nanotechnology
Surfaces and Interfaces
Condensed Matter Physics
Ormosil
Silicate
Polymerization
two-photon polymerization
chemistry.chemical_compound
chemistry
Siloxane
Electrochemistry
Microelectronics
General Materials Science
Thin film
business
Elastic modulus
Spectroscopy
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- Langmuir 22 (2006): 11158–11162. doi:10.1021/la061520w, info:cnr-pdr/source/autori:Giovanni Palmisano, Eric Le Bourhis, Rosaria Ciriminna, Davide Tranchida, Mario Pagliaro/titolo:ORMOSIL thin films: tuning the mechanical properties via a nanochemistry appoach/doi:10.1021%2Fla061520w/rivista:Langmuir/anno:2006/pagina_da:11158/pagina_a:11162/intervallo_pagine:11158–11162/volume:22
- Accession number :
- edsair.doi.dedup.....96cdc15d585791d5103f7e80e4c6959c
- Full Text :
- https://doi.org/10.1021/la061520w