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Impact of gate tunnelling leakage on CMOS circuits with full open defects

Authors :
Joan Figueras
D. Arumi
B. Kruseman
Rosa Rodriguez-Montanes
S. Eichenberger
C. Hora
Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica
Universitat Politècnica de Catalunya. QINE - Disseny de Baix Consum, Test, Verificació i Circuits Integrats de Seguretat
Source :
UPCommons. Portal del coneixement obert de la UPC, Universitat Politècnica de Catalunya (UPC), Recercat. Dipósit de la Recerca de Catalunya, instname
Publication Year :
2007
Publisher :
Institution of Electrical Engineers, 2007.

Abstract

Electronics Letter of the Month Interconnecting lines with full open defects become floating lines. In nanometric CMOS technologies, gate tunnelling leakage currents impact the behaviour of these lines, which cannot be considered electrically isolated anymore. The voltage of the floating node is determined by its neighbours and leakage currents. After some time an equilibrium is reached between these effects. Theoretical analysis and experimental evidence of this behaviour are presented. Peer Reviewed Award-winning

Details

Language :
English
Database :
OpenAIRE
Journal :
UPCommons. Portal del coneixement obert de la UPC, Universitat Politècnica de Catalunya (UPC), Recercat. Dipósit de la Recerca de Catalunya, instname
Accession number :
edsair.doi.dedup.....9b5f2a11c08adf37f023ee6ef91476ad