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Impact of gate tunnelling leakage on CMOS circuits with full open defects
- Source :
- UPCommons. Portal del coneixement obert de la UPC, Universitat Politècnica de Catalunya (UPC), Recercat. Dipósit de la Recerca de Catalunya, instname
- Publication Year :
- 2007
- Publisher :
- Institution of Electrical Engineers, 2007.
-
Abstract
- Electronics Letter of the Month Interconnecting lines with full open defects become floating lines. In nanometric CMOS technologies, gate tunnelling leakage currents impact the behaviour of these lines, which cannot be considered electrically isolated anymore. The voltage of the floating node is determined by its neighbours and leakage currents. After some time an equilibrium is reached between these effects. Theoretical analysis and experimental evidence of this behaviour are presented. Peer Reviewed Award-winning
- Subjects :
- Engineering
business.industry
Contact line
Electrical engineering
Circuits integrats -- CMOS -- Disseny i construcció
Hardware_PERFORMANCEANDRELIABILITY
Enginyeria electrònica::Microelectrònica::Circuits integrats [Àrees temàtiques de la UPC]
CMOS integrated circuits
Tunnel effect
Metal oxide semiconductors, Complementary
CMOS
Nanoelectronics
Hardware_GENERAL
Hardware_INTEGRATEDCIRCUITS
Optoelectronics
Electrical and Electronic Engineering
Hardware_ARITHMETICANDLOGICSTRUCTURES
business
Quantum tunnelling
Hardware_LOGICDESIGN
Electronic circuit
Voltage
Leakage (electronics)
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- UPCommons. Portal del coneixement obert de la UPC, Universitat Politècnica de Catalunya (UPC), Recercat. Dipósit de la Recerca de Catalunya, instname
- Accession number :
- edsair.doi.dedup.....9b5f2a11c08adf37f023ee6ef91476ad