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CMOS technology platform for ubiquitous microsensors
- Publication Year :
- 2018
- Publisher :
- IEEE, 2018.
-
Abstract
- In this paper we review a range of microsensors based on a common CMOS platform technology. The technology features a CMOS core which includes high temperature tungsten metallization and a post-CMOS deep reactive ion etching step of the substrate to release membranes, where the sensing elements are embedded. In one single process we were able to accommodate a variety of sensors such as gas, humidity, pressure, flow, temperature and infra-red detectors and emitters. The benefits of this platform are: (i) ultra-low power consumption, (ii) small form factor, (iii) high reliability and yield (iv) possibility of on-chip electronics and last but not least (v) low unit price.
- Subjects :
- CMOS sensing platform
Engineering
pressure sensors
Nanotechnology
Hardware_PERFORMANCEANDRELIABILITY
02 engineering and technology
Substrate (electronics)
01 natural sciences
temperature sensors
Reliability (semiconductor)
Hardware_INTEGRATEDCIRCUITS
Deep reactive-ion etching
humidity sensors
Infra-Red devices
Electronics
business.industry
010401 analytical chemistry
Detector
021001 nanoscience & nanotechnology
Pressure sensor
0104 chemical sciences
Small form factor
gas sensors
CMOS
0210 nano-technology
business
flow sensors
Subjects
Details
- Database :
- OpenAIRE
- Accession number :
- edsair.doi.dedup.....9d254b4f07916f8a071dbd53bec312a0
- Full Text :
- https://doi.org/10.17863/cam.34150