Antireflective GaN Nanoridge Texturing by Metal-Assisted Chemical Etching via a Thermally Dewetted Pt Catalyst Network for Highly Responsive Ultraviolet Photodiodes

MLA

Yikai Liao, et al. “Antireflective GaN Nanoridge Texturing by Metal-Assisted Chemical Etching via a Thermally Dewetted Pt Catalyst Network for Highly Responsive Ultraviolet Photodiodes.” ACS Applied Materials & Interfaces, vol. 15, Mar. 2023, pp. 13343–52. EBSCOhost, https://doi.org/10.1021/acsami.2c22929.

APA

Yikai Liao, You Jin Kim, Junyu Lai, Jung-Hun Seo, & Munho Kim. (2023). Antireflective GaN Nanoridge Texturing by Metal-Assisted Chemical Etching via a Thermally Dewetted Pt Catalyst Network for Highly Responsive Ultraviolet Photodiodes. ACS Applied Materials & Interfaces, 15, 13343–13352. https://doi.org/10.1021/acsami.2c22929

Chicago

Yikai Liao, You Jin Kim, Junyu Lai, Jung-Hun Seo, and Munho Kim. 2023. “Antireflective GaN Nanoridge Texturing by Metal-Assisted Chemical Etching via a Thermally Dewetted Pt Catalyst Network for Highly Responsive Ultraviolet Photodiodes.” ACS Applied Materials & Interfaces 15 (March): 13343–52. doi:10.1021/acsami.2c22929.