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Rotating Cylinder‐Assisted Nanoimprint Lithography for Enhanced Chemisorbable Filtration Complemented by Molecularly Imprinted Polymers
- Source :
- Small. 17:2105733
- Publication Year :
- 2021
- Publisher :
- Wiley, 2021.
-
Abstract
- Rotating cylindrical stamp-based nanoimprint technique has many advantages, including the continuous fabrication of intriguing micro/nanostructures and rapid pattern transfer on a large scale. Despite these advantages, the previous nanoimprint lithography has rarely been used for producing sophisticated nanoscale patterns on a non-planar substrate that has many extended applications. Here, the simple integration of nanoimprinting process with a help of a transparent stamp wrapped on the cylindrical roll and UV optical source in the core to enable high-throughput pattern transfer, particularly on a fabric substrate is demonstrated. Moreover, as a functional resin material, this innovative strategy involves a synergistic approach on the synthesis of molecularly imprinted polymer, which are spatially organized free-standing perforated nanostructures such as nano/microscale lines, posts, and holes patterns on various woven or nonwoven blank substrates. The proposed materials can serve as a self-encoded filtration medium for selective separation of formaldehyde molecules. It is envisioned that the combinatorial fabrication process and attractive material paves the way for designing next-generation separation systems in use to capture industrial or household toxic substances.
- Subjects :
- Fabrication
Nanostructure
Materials science
Molecularly imprinted polymer
Nanotechnology
General Chemistry
Substrate (printing)
Nanostructures
Nanoimprint lithography
law.invention
Biomaterials
Molecularly Imprinted Polymers
law
Nano
Printing
General Materials Science
Nanoscopic scale
Microscale chemistry
Biotechnology
Subjects
Details
- ISSN :
- 16136829 and 16136810
- Volume :
- 17
- Database :
- OpenAIRE
- Journal :
- Small
- Accession number :
- edsair.doi.dedup.....afc05238b8136852e913040955925a5e
- Full Text :
- https://doi.org/10.1002/smll.202105733