Sub-100 μs nanoimprint lithography at wafer scale

Display Omitted A full 4¿ wafer is nanopatterned by an ultrafast thermal NIL process in 100µs.Stamps with integrated heater enable ultrafast cycles at very high temperature.The thermal cycle is implemented with a single short very intense current pulse.A new tool for the ultrafast NIL (or pulsed-NIL) process has been developed.The process applies to a wide range of thermoplastic materials. We present here an ultrafast thermal NIL technology, which enables the patterning of full wafers on the 100µs time-scale. This technique makes use of stamps with a heating layer integrated beneath their nanostructured surfaces. Injecting a single, short (