Relationship between nano-architectured Ti1−x Cu x thin film and electrical resistivity for resistance temperature detectors

MLA

Joel Nuno Pinto Borges, et al. “Relationship between Nano-Architectured Ti1−x Cu x Thin Film and Electrical Resistivity for Resistance Temperature Detectors.” Journal of Materials Science, vol. 52, Dec. 2016, pp. 4878–85. EBSCOhost, https://doi.org/10.1007/s10853-016-0722-x.

APA

Joel Nuno Pinto Borges, Filipe Vaz, Armando Ferreira, Marco Sampaio Rodrigues, Senentxu Lanceros-Méndez, & Carla D. Lopes. (2016). Relationship between nano-architectured Ti1−x Cu x thin film and electrical resistivity for resistance temperature detectors. Journal of Materials Science, 52, 4878–4885. https://doi.org/10.1007/s10853-016-0722-x

Chicago

Joel Nuno Pinto Borges, Filipe Vaz, Armando Ferreira, Marco Sampaio Rodrigues, Senentxu Lanceros-Méndez, and Carla D. Lopes. 2016. “Relationship between Nano-Architectured Ti1−x Cu x Thin Film and Electrical Resistivity for Resistance Temperature Detectors.” Journal of Materials Science 52 (December): 4878–85. doi:10.1007/s10853-016-0722-x.