Comparative study of two Atomic Layer Etching processes for GaN

MLA

Thierry Chevolleau, et al. Comparative Study of Two Atomic Layer Etching Processes for GaN. July 2019. EBSCOhost, https://doi.org/10.1116/1.5134130⟩.

APA

Thierry Chevolleau, Takashi Teramoto, Christian Dussarrat, Etienne Gheeraert, H. Mariette, Christophe Durand, Christophe Vallée, C. Mannequin, & Katsuhiro Akimoto. (2019). Comparative study of two Atomic Layer Etching processes for GaN. https://doi.org/10.1116/1.5134130⟩

Chicago

Thierry Chevolleau, Takashi Teramoto, Christian Dussarrat, Etienne Gheeraert, H. Mariette, Christophe Durand, Christophe Vallée, C. Mannequin, and Katsuhiro Akimoto. 2019. “Comparative Study of Two Atomic Layer Etching Processes for GaN,” July. doi:10.1116/1.5134130⟩.