CVD preparation of vertical graphene nanowalls/VO2 (B) composite films with superior thermal sensitivity in uncooled infrared detector

Vanadium dioxide with superior thermal sensitivity is one of the most preferred materials used in microbolometer, and the B phase of VO2 is particularly prominent. However, conventional VO2 (B) undergoes low temperature-coefficient of resistance (TCR) values and large resistances. In this paper, simple controllable composite films of vertical graphene nanowalls/VO2 (B) (i.e., VGNWs/VO2 (B)) with a suitable square resistance (12.98 kΩ) and a better temperature-coefficient of resistance (TCR) (−3.2%/K) were prepared via low pressure chemical vapor deposition. The VGNWs can provide a fast channel for electron transport and enhance the conductivity of VO2 (B). This preparation method can provide a low cost, facile and simple pathway for the design and fabrication of high performance VO2 (B) thin films with superior electrical properties for its application in uncooled infrared detectors. Keywords: Vertical graphene nanowalls, VO2 (B) films, Chemical vapor deposition, Uncooled infrared detectors