Miniaturized optical devices produced by electron beam lithography in lithium fluoride films

The use of versatile, well-Assessed and low-cost fabrication techniques consisting in physical vapor deposition of LiF films combined with an electron-beam direct writing lithographic process allows the realization of optically confined active structures, like broad-band emitters, channel waveguides and optical microcavities operating in the visible. © 2000 American Institute of Physics.