A PIC-MC simulation of the effect of frequency on the characteristics of VHF SiH4/H2discharges

MLA

W J Goedheer, and M Yan. “A PIC-MC Simulation of the Effect of Frequency on the Characteristics of VHF SiH4/H2discharges.” Plasma Sources Science and Technology, vol. 8, Jan. 1999, pp. 349–54. EBSCOhost, https://doi.org/10.1088/0963-0252/8/3/302.

APA

W J Goedheer, & M Yan. (1999). A PIC-MC simulation of the effect of frequency on the characteristics of VHF SiH4/H2discharges. Plasma Sources Science and Technology, 8, 349–354. https://doi.org/10.1088/0963-0252/8/3/302

Chicago

W J Goedheer, and M Yan. 1999. “A PIC-MC Simulation of the Effect of Frequency on the Characteristics of VHF SiH4/H2discharges.” Plasma Sources Science and Technology 8 (January): 349–54. doi:10.1088/0963-0252/8/3/302.