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Low energy electron beam induced vacancy activation in GaN
- Source :
- Applied Physics Letters. 100:122105
- Publication Year :
- 2012
- Publisher :
- AIP Publishing, 2012.
-
Abstract
- Experimental evidence on low energy electron beam induced point defect activation in GaN grown by metal-organic vapor phase epitaxy(MOVPE) is presented. The GaN samples are irradiated with a 5–20 keV electron beam of a scanning electron microscope and investigated by photoluminescence and positron annihilation spectroscopy measurements. The degradation of the band-to-band luminescence of the irradiatedGaN films is associated with the activation of point defects. The activated defects were identified as in-grown Ga-vacancies. We propose that MOVPE-GaN contains a significant concentration of passive VGa-H n complexes that can be activated by H removal during low energy electron irradiation.
- Subjects :
- III-V semiconductors
Materials science
Photoluminescence
Physics and Astronomy (miscellaneous)
Scanning electron microscope
ta221
Analytical chemistry
electron beam effects
02 engineering and technology
01 natural sciences
Positron annihilation spectroscopy
law.invention
law
Vacancy defect
0103 physical sciences
Electron beam processing
Metalorganic vapour phase epitaxy
Electron beam-induced deposition
ta216
ta218
010302 applied physics
ta214
vapour phase epitaxial growth
ta114
ta213
Condensed matter physics
Physics
positron annihilation
vacancies (crystal)
semiconductor epitaxial layers
021001 nanoscience & nanotechnology
semiconductor growth
MOCVD
photoluminescence
gallium compounds
Electron microscope
0210 nano-technology
scanning electron microscopy
Subjects
Details
- ISSN :
- 10773118 and 00036951
- Volume :
- 100
- Database :
- OpenAIRE
- Journal :
- Applied Physics Letters
- Accession number :
- edsair.doi.dedup.....e74fac4b765188f9c031a39ba4aa4770