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Influence of Ionic Strength on the Deposition of Metal–Phenolic Networks

Authors :
Blaise L. Tardy
Joseph J. Richardson
Frank Caruso
Yunlu Dai
Pil J. Yoo
Irene Yarovsky
Junling Guo
Quinn A Besford
Kang Liang
Andrew J. Christofferson
Gwan H. Choi
Chien W. Ong
Jiwei Cui
Source :
Langmuir. 33:10616-10622
Publication Year :
2017
Publisher :
American Chemical Society (ACS), 2017.

Abstract

Metal–phenolic networks (MPNs) are a versatile class of self-assembled materials that are able to form functional thin films on various substrates with potential applications in areas including drug delivery and catalysis. Different metal ions (e.g., FeIII, CuII) and phenols (e.g., tannic acid, gallic acid) have been investigated for MPN film assembly; however, a mechanistic understanding of the thermodynamics governing MPN formation remains largely unexplored. To date, MPNs have been deposited at low ionic strengths (

Details

ISSN :
15205827 and 07437463
Volume :
33
Database :
OpenAIRE
Journal :
Langmuir
Accession number :
edsair.doi.dedup.....e9dfc940dabae6cb0bb32c3a11db5a78
Full Text :
https://doi.org/10.1021/acs.langmuir.7b02692