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極薄酸化膜を用いたAl2O3/SiC-MOSFETのチャネル移動度の向上

Authors :
Hatayama, Tomohiro
Hino, Shiro
Kato, Jun
TOKUMITSU, EISUKE
Miura, Naruhisa
Oomori, Tatsuo
Publication Year :
2007

Details

Language :
Japanese
Database :
OpenAIRE
Accession number :
edsair.jairo.........ba893e8761afe04bf6bdf580ff38987c

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