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Comparative Study of Metalorganic Chemical Vapour Deposition of HfO2 and Al2O3 Gate Insulators on SiC for Power MOSFET Applications
Details
- Language :
- English
- Database :
- OpenAIRE
- Accession number :
- edsair.jairo.........d47e238f6889970ad5abfb2253f4d688