Metal contacts to lowly doped Si and ultra thin SOI

Authors :: Rajasekharan, B.
Salm, Cora
Wolters, Robertus A.M.
Aarnink, Antonius A.I.
Boogaard, A.
Schmitz, Jurriaan
Source :: Proceedings of Fifth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits, 29-30, STARTPAGE=29;ENDPAGE=30;TITLE=Proceedings of Fifth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits
Publication Year :: 2009
Publisher :: Chalmers University of Technology, 2009.
Abstract: We present our investigations on the fabrication of ohmic and Schottky contacts of several metals on lowly doped bulk Si and SOI wafers. Through this paper we evaluate the fabrication of rectifying devices in which no doping is intentionally introduced.

Subjects :: EWI-15226
IR-65430
SC-ICF: Integrated Circuit Fabrication
METIS-263781

Database :: OpenAIRE
Journal :: Proceedings of Fifth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits, 29-30, STARTPAGE=29;ENDPAGE=30;TITLE=Proceedings of Fifth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits
Accession number :: edsair.narcis........58f75e4785815b035f0200074634c821

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