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Optical band gap of BiFe03 grown by adsorption-controlled molecular-beam epitaxy

Authors :
Ihlefeld, J.F.
Podraza, N. J.
Pan, X. Q.
Schubert, J.
Ramesh, R.
Schlom, D. G.
Liu, Z.K.
Rai, R.C.
Xu, X.
Heeg, T.
Chen, Y.B.
Li, J.
Collins, R. W.
Musfeldt, J.L.
Source :
Applied physics letters 92, 142908 (2008). doi:10.1063/1.2901160
Publication Year :
2008
Publisher :
American Institute of Physics, 2008.

Abstract

BiFeO3 thin films have been deposited on (001) SrTiO3 substrates by adsorption-controlled reactive molecular-beam epitaxy. For a given bismuth overpressure and oxygen activity, single-phase BiFeO3 films can be grown over a range of deposition temperatures in accordance with thermodynamic calculations. Four-circle x-ray diffraction reveals phase-pure, epitaxial films with omega rocking curve full width at half maximum values as narrow as 29 arc sec (0.008 degrees). Multiple-angle spectroscopic ellipsometry reveals a direct optical band gap at 2.74 eV for stoichiometric as well as 5% bismuth-deficient single-phase BiFeO3 films. (C) 2008 American Institute of Physics.

Subjects

Subjects :
ddc:530

Details

Language :
English
Database :
OpenAIRE
Journal :
Applied physics letters 92, 142908 (2008). doi:10.1063/1.2901160
Accession number :
edsair.od......3364..1e9dc6b515dcd6b059008ca8b8ae5dc0