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New method to calibrate the pattern dependency of selective epitaxy of SiGe layers

Authors :
Kolahdouz M.
Maresca Luca
Ostling M.
Riley D.
Wise R.
Radamson H. H.
Kolahdouz, M.
Maresca, Luca
Ostling, M.
Riley, D.
Wise, R.
Radamson, H. H.
Publication Year :
2009

Details

Database :
OpenAIRE
Accession number :
edsair.od......3730..43b235d80509059dd1bc04a50bd6f959

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