Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography

MLA

Fallica, Roberto, et al. Lithographic Performance of ZEP520A and Mr-PosEBR Resists Exposed by Electron Beam and Extreme Ultraviolet Lithography. 2017. EBSCOhost, https://doi.org/10.1116/1.5003476.

APA

Fallica, R., Kazazis, D., Kirchner, R., Voigt, A., Mochi, I., Schift, H., & Ekinci, Y. (2017). Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography. https://doi.org/10.1116/1.5003476

Chicago

Fallica, Roberto, Dimitrios Kazazis, Robert Kirchner, Anja Voigt, Iacopo Mochi, Helmut Schift, and Yasin Ekinci. 2017. “Lithographic Performance of ZEP520A and Mr-PosEBR Resists Exposed by Electron Beam and Extreme Ultraviolet Lithography.” doi:10.1116/1.5003476.