Non-evaporable getter coating chambers for extreme high vacuum

Techniques for NEG coating a large diameter chamber are presented along with vacuum measurements in the chamber using several pumping configurations, with base pressure as low as 1.56x10^-12 Torr (N2 equivalent) with only a NEG coating and small ion pump. We then describe modifications to the NEG coating process to coat complex geometry chambers for ultra-cold atom trap experiments. Surface analysis of NEG coated samples are used to measure composition and morphology of the thin films. Finally, pressure measurements are compared for two NEG coated polarized electron source chambers: the 130 kV polarized electron source at Jefferson Lab and the upgraded 350 kV polarized 2 electron source, both of which are approaching or within the extreme high vacuum (XHV) range, defined as P<7.5x10^-13 Torr.
Comment: Corrected Typos, adjusted table formats