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High resistance of superconducting TiN thin films against environmental attacks

Authors :
Guo, Zhangyuan
Ge, Min
Zhou, You-Qi
Bi, Jiachang
Zhang, Qinghua
Zhang, Jiahui
Ye, Jin-Tao
Zhai, Rongjing
Ge, Fangfang
Huang, Yuan
Zhang, Ruyi
Yao, Xiong
Huang, Liang-Feng
Cao, Yanwei
Source :
Materials Horizons 2024
Publication Year :
2024

Abstract

Superconductors, an essential class of functional materials, hold a vital position in both fundamental science and practical applications. However, most superconductors, including MgB$_2$, Bi$_2$Sr$_2$CaCu$_2$O$_{8+\delta}$, and FeSe, are highly sensitive to environmental attacks (such as water and moist air), hindering their wide applications. More importantly, the surface physical and chemical processes of most superconductors in various environments remain poorly understood. Here, we comprehensively investigate the high resistance of superconducting titanium nitride (TiN) epitaxial films against acid and alkali attacks. Unexpectedly, despite immersion in acid and alkaline solutions for over 7 days, the crystal structure and superconducting properties of TiN films remain stable, as demonstrated by high-resolution X-ray diffraction, electrical transport, atomic force microscopy, and scanning electron microscope. Furthermore, combining scanning transmission electron microscopy analysis with density functional theory calculations revealed the corrosion mechanisms: acid corrosions lead to the creation of numerous defects due to the substitution of Cl ions for N anions, whereas alkaline environments significantly reduce the film thickness through the stabilization of OH$^\ast$ adsorbates. Our results uncover the unexpected stability and durability of superconducting materials against environmental attacks, highlighting their potential for enhanced reliability and longevity in diverse applications.<br />Comment: 10 pages, 8 figures

Details

Database :
arXiv
Journal :
Materials Horizons 2024
Publication Type :
Report
Accession number :
edsarx.2410.17588
Document Type :
Working Paper
Full Text :
https://doi.org/10.1039/D4MH00959B