Back to Search Start Over

Influence of substrate on structural, morphological and optical properties of TiO2 thin films deposited by reaction magnetron sputtering

Authors :
Xinghua Zhu
Peng Gu
Haihua Wu
Dingyu Yang
Hui Sun
Peihua Wangyang
Jitao Li
Haibo Tian
Source :
AIP Advances, Vol 7, Iss 12, Pp 125326-125326-8 (2017)
Publication Year :
2017
Publisher :
AIP Publishing LLC, 2017.

Abstract

Titanium dioxide (TiO2) films have been prepared by DC reaction magnetron sputtering technique on different substrates (glass, SiO2, platinum electrode-Pt, Silicon-Si). X-ray diffraction (XRD) patterns showed that all TiO2 films were grown along the preferred orientation of (110) plane. Samples on Si and Pt substrates are almost monophasic rutile, however, samples on glass and SiO2 substrates accompanied by a weak anatase structure. Atomic force microscopy (AFM) images revealed uniform grain distribution except for films on Pt substrates. Photoluminescence (PL) spectra showed obvious intrinsic emission band, but films on glass was accompanied by a distinct defect luminescence region. Raman spectroscopy suggested that all samples moved to high wavenumbers and films on glass moved obviously.

Subjects

Subjects :
Physics
QC1-999

Details

Language :
English
ISSN :
21583226
Volume :
7
Issue :
12
Database :
Directory of Open Access Journals
Journal :
AIP Advances
Publication Type :
Academic Journal
Accession number :
edsdoj.04d9192bb39b461e835a7ff1399378c3
Document Type :
article
Full Text :
https://doi.org/10.1063/1.5017242