Cite
Atomic and electronic basis for the serrations of refractory high-entropy alloys
MLA
William Yi Wang, et al. “Atomic and Electronic Basis for the Serrations of Refractory High-Entropy Alloys.” Npj Computational Materials, vol. 3, no. 1, June 2017, pp. 1–10. EBSCOhost, https://doi.org/10.1038/s41524-017-0024-0.
APA
William Yi Wang, Shun Li Shang, Yi Wang, Fengbo Han, Kristopher A. Darling, Yidong Wu, Xie Xie, Oleg N. Senkov, Jinshan Li, Xi Dong Hui, Karin A. Dahmen, Peter K. Liaw, Laszlo J. Kecskes, & Zi-Kui Liu. (2017). Atomic and electronic basis for the serrations of refractory high-entropy alloys. Npj Computational Materials, 3(1), 1–10. https://doi.org/10.1038/s41524-017-0024-0
Chicago
William Yi Wang, Shun Li Shang, Yi Wang, Fengbo Han, Kristopher A. Darling, Yidong Wu, Xie Xie, et al. 2017. “Atomic and Electronic Basis for the Serrations of Refractory High-Entropy Alloys.” Npj Computational Materials 3 (1): 1–10. doi:10.1038/s41524-017-0024-0.