Near-field sub-diffraction photolithography with an elastomeric photomask

MLA

Sangyoon Paik, et al. “Near-Field Sub-Diffraction Photolithography with an Elastomeric Photomask.” Nature Communications, vol. 11, no. 1, Feb. 2020, pp. 1–13. EBSCOhost, https://doi.org/10.1038/s41467-020-14439-1.

APA

Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang-Yong Jeong, I Sak Lee, Jekwan Lee, Hongjae Moon, Jaejun Lee, Kiseok Chang, Su Seok Choi, Jeongmin Moon, Soonshin Jung, Shinill Kang, Wooyoung Lee, Heon-Jin Choi, Hyunyong Choi, Hyun Jae Kim, … Wooyoung Shim. (2020). Near-field sub-diffraction photolithography with an elastomeric photomask. Nature Communications, 11(1), 1–13. https://doi.org/10.1038/s41467-020-14439-1

Chicago

Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang-Yong Jeong, I Sak Lee, et al. 2020. “Near-Field Sub-Diffraction Photolithography with an Elastomeric Photomask.” Nature Communications 11 (1): 1–13. doi:10.1038/s41467-020-14439-1.