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Mask-related dermatological problems during COVID-19 pandemic among a sample of Egyptian population

Authors :
Ihab Younis
Sherine M. Elsabbagh
Samah E. Ibrahim
Source :
Journal of the Egyptian Women’s Dermatologic Society, Vol 21, Iss 3, Pp 193-198 (2024)
Publication Year :
2024
Publisher :
Wolters Kluwer Medknow Publications, 2024.

Abstract

Background During the coronavirus disease 2019 pandemic, mask wearing was obligatory in many countries to decrease infection risk among individuals. However, long-term mask wearing was associated with the development of various adverse skin reactions. Objective To assess possible dermatological complications due to mask wear during the coronavirus disease 2019 pandemic among a sample of the Egyptian population. Patients and methods The present hospital-based cross-sectional study included 320 patients who had attended outpatient dermatology clinic of the university hospitals with any dermatological symptoms. Patients wore face surgical masks during the pandemic for at least 3 months during outdoor activity. All patients were subjected to detailed history taking about onset, duration of the skin condition, whether an initial attack or pre-existing condition, and complete dermatological examination to confirm the diagnosis and evaluate severity level. Results This study showed that long‐term mask use caused new-onset skin diseases and increased dermatological facial diseases. The most common skin finding was Maskne (46.9%), followed by contact dermatitis, perioral dermatitis, and rosacea (14.1, 9.4, and 7.8%, respectively), while the remaining 21.9% were complaining of nonmask-related dermatoses. There was a significant positive correlation between mask-wearing duration and disease severity (P

Details

Language :
English
ISSN :
20902565
Volume :
21
Issue :
3
Database :
Directory of Open Access Journals
Journal :
Journal of the Egyptian Women’s Dermatologic Society
Publication Type :
Academic Journal
Accession number :
edsdoj.260e2cc662f045798967a34532459932
Document Type :
article
Full Text :
https://doi.org/10.4103/jewd.jewd_86_23