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Prediction and Effect Verification of Thiamine as a Leveling Agent in Chip Wafer Electroplating

Authors :
Hu Wei
Tong Tan
Renlong Liu
Lanfeng Guo
Changyuan Tao
Xiang Qin
Source :
ACS Omega, Vol 8, Iss 48, Pp 45495-45501 (2023)
Publication Year :
2023
Publisher :
American Chemical Society, 2023.

Subjects

Subjects :
Chemistry
QD1-999

Details

Language :
English
ISSN :
24701343
Volume :
8
Issue :
48
Database :
Directory of Open Access Journals
Journal :
ACS Omega
Publication Type :
Academic Journal
Accession number :
edsdoj.2774394bf69f4aabbb3d206ed3129edb
Document Type :
article
Full Text :
https://doi.org/10.1021/acsomega.3c05248