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Tunable Doping of Rhenium and Vanadium into Transition Metal Dichalcogenides for Two‐Dimensional Electronics

Authors :
Shisheng Li
Jinhua Hong
Bo Gao
Yung‐Chang Lin
Hong En Lim
Xueyi Lu
Jing Wu
Song Liu
Yoshitaka Tateyama
Yoshiki Sakuma
Kazuhito Tsukagoshi
Kazu Suenaga
Takaaki Taniguchi
Source :
Advanced Science, Vol 8, Iss 11, Pp n/a-n/a (2021)
Publication Year :
2021
Publisher :
Wiley, 2021.

Abstract

Abstract Two‐dimensional (2D) transition metal dichalcogenides (TMDCs) with unique electrical properties are fascinating materials used for future electronics. However, the strong Fermi level pinning effect at the interface of TMDCs and metal electrodes always leads to high contact resistance, which seriously hinders their application in 2D electronics. One effective way to overcome this is to use metallic TMDCs or transferred metal electrodes as van der Waals (vdW) contacts. Alternatively, using highly conductive doped TMDCs will have a profound impact on the contact engineering of 2D electronics. Here, a novel chemical vapor deposition (CVD) using mixed molten salts is established for vapor–liquid–solid growth of high‐quality rhenium (Re) and vanadium (V) doped TMDC monolayers with high controllability and reproducibility. A tunable semiconductor to metal transition is observed in the Re‐ and V‐doped TMDCs. Electrical conductivity increases up to a factor of 108 in the degenerate V‐doped WS2 and WSe2. Using V‐doped WSe2 as vdW contact, the on‐state current and on/off ratio of WSe2‐based field‐effect transistors have been substantially improved (from ≈10–8 to 10–5 A; ≈104 to 108), compared to metal contacts. Future studies on lateral contacts and interconnects using doped TMDCs will pave the way for 2D integrated circuits and flexible electronics.

Details

Language :
English
ISSN :
21983844
Volume :
8
Issue :
11
Database :
Directory of Open Access Journals
Journal :
Advanced Science
Publication Type :
Academic Journal
Accession number :
edsdoj.55a6c196190546469e597ec72c2a457c
Document Type :
article
Full Text :
https://doi.org/10.1002/advs.202004438